Mr. Beliakou

Improve redeposition managementSince Ta atoms are sputtered in many directions, shields and chamber walls receive Ta redeposition. Their shape and replacement schedule should be part of the same model.

Use multi-zone magnetron controlIf possible, control several magnetic zones to redistribute plasma density and ion bombardment.

Pre-shape the Ta targetThis is closer to your compensation idea. Instead of heating, make the target initially thicker where erosion will be strongest. Then the target profile becomes more uniform during usage.

Use a variable magnetic-field profile during target lifeAt the beginning, use one racetrack position; later, shift it slightly inward or outward. This can spread erosion over more target area.

Change magnet configurationDesign the magnetron so that the plasma density is distributed over a wider area, not concentrated in one narrow ring.

Move or scan the magnetron fieldIf the racetrack is caused by magnetic field localization, then move the magnetic field during the target lifetime. The erosion zone will move, and Ta will be consumed more uniformly.

Temperature compensation is an interesting idea, but not the most practical solution for improving Ta target utilization.

This project investigates the nonuniform erosion of an expensive Ta sputtering target during Ta/TaN PVD. A deep racetrack groove forces target replacement while a significant amount of tantalum remains unused. Using PRIZ problem-solving tools, the project explores the system’s functions, identifies the root causes of localized erosion, and develops ways to improve target utilization without reducing deposition rate or production throughput.

Ta PVD Target Racetrack Erosion Reduces Target Utilization - Functional Modeling

Projects related to innovations and problem solving in the microchip manufacturing

Measured or perceived thermal condition of an object or system.  Includes other thermal parameters, such as heat capacity, conductivity, radiation, and convection.

Temperature

The field creation directs the Ar+ ions to the Ta sputtering target and releases Ta atoms

Spheroidality - Curvature

Periodic action

Blessing in disguise (Turn Lemons into Lemonade)

Color changes

Component: Magnetron

The internal or external contour or profile of a component or system as required for ergonomic and function rather than aesthetic reasons

Shape

The field is concentrated between the V and S poles and does not provide equal heating of the Ta target.