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Updated 07/10/2024
Project Poster | Improvement of Polystyrene Nano-Spheres Density and Uniformity of Mechanical Organization on PDMS Substrates

Lotem Kitaroo and Sharon Luzky

This project involves the study of polyspherene nanospheres deposited on PDMS (Polydimethylsiloxane) samples. The PDMS samples have undergone a mechanical rubbing process for various durations to create surface patterns. Following this, the samples were subjected to a sputtering process in a clean room environment to coat them with polyspherene nanospheres. The primary objective of the project is to achieve a dense and uniform layer of polyspherene nanospheres on the PDMS substrates. This dense coating is crucial for the intended applications of these nanospheres in fields such as nanoelectronics, biomedical devices, and surface coatings. Despite the systematic approach, the SEM (Scanning Electron Microscope) images reveal that the polyspherene nanospheres are not achieving the desired dense packing. Instead, the nanospheres appear to be sparsely distributed, with noticeable gaps between them, which undermines the effectiveness and uniformity required for their applications.

Updated 07/10/2024
Project Poster | Wafer cleaning issues in the wet process

Wet cleaning is widely used in microchip manufacturing. Single wafer equipment is working as follows. A wafer rotates, and chemistry is poured from a movable nozzle. Water rinsing is performed at the end of the process. Loading of a new batch of the chemistry resulted in excursion - a strongly increased amount of defects was observed on the wafer after the processing. The project is dedicated to the failure analysis and creation of innovative solutions.

Updated 07/9/2024
Project Poster | Diffusion furnace - Process Functional Modeling (PFM)

The process is related to microelectronics - microchip manufacturing. The purpose of the process is to create a SiO2 layer on the surface of a Si wafer. Equipment: Vertical furnace to heat the wafers in the Q2 atmosphere and perform oxidation on the wafer surface. Process: The oxidation occurs on the front side and on the back side of the wafer Requirements: Create a SiO2 thin layer with a certain thickness and low sigma - low standard deviation of the thickness between the wafers and within the wafer Failure: Wafers from the lower zone have higher thickness and significantly higher within wafer sigma (standard deviation of the thickness within the wafer)

Updated 06/25/2024
Project Poster | Laundry clothes - example for PFM Webinar #10

The project aims to analyze the washing, drying, and ironing of clothes. Use Process Functional Modeling for the analysis. This is an example of how to use Process Functional Modeling and see this tool's power.

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Updated 04/7/2024
Project Poster | Smart Climate Control System for Space Stations (SCCSS)

Передовая система управления климатом, разработанная специально для космических станций и кораблей. Эта система объединяет инновационные технологии искусственного интеллекта и машинного обучения для обеспечения оптимальных условий жизни в космической среде. Она способна автономно мониторить и регулировать температуру, влажность, давление и газовый состав воздуха, обеспечивая высокий уровень безопасности и комфорта экипажа. Разработка учитывает критические вызовы длительных космических полётов, предлагая решения для повышения эффективности и снижения рисков в экстремальных условиях космоса.