xss"><h1>mm

Define the more contaminated areas and spend more time/chemical to clean the specific areas

Increase the temperature of the solution to make the process more effective

Principle #15 – Dynamism – change an object from rigid to movable or adaptiveThe idea that is generated is as follows:Replace the constant flow of the chemistry with variable flow, especially in the and of the process, to ensure defects removal from the disc.So, the idea is to change (even make pulses) flow while the cleaning process.

לטבול את הצלחת במים במקום לשטוף אותה בכל פעם

מערכת כיווון אוטמיטת למסוע

The wafer is contaminated not equally. Use special cleaning on the areas that are more contaminated

The general conclusion is to eliminate the system of the air supply and exhaust. Let air enter the chamber and convert exhaust to drain with very little under-pressure. The will stabilize the performance, reduce the cost and make the system more simple.

Principle #16 – Partial or accessive action – do slightly more or slightly lessIf 100 percent of an object is hard to achieve using a given solution method then, by using 'slightly less' or 'slightly more' of the same method, the problem may be considerably easier to solve.A wafer is not contaminated equally: there are some areas with more defects and some areas with fewer amount of defectsThe idea is to use the shower with a graduated flow - the more the defects the higher the flow

Principle #13 – The other way around – Turn the object “upside-down”This is a great tip. Indeed, why the disk is kept “face-up” during the washing process?It would be much better to keep the disc “face down” to improve the removal of the defects from the surface.So, the idea is to keep the wafer “face down” during the washing process﻿<img 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">

Increase the pressure in the chamber

Prevent evaporation of the chemistry from the wafer

To increase the density of the chemistry by temperature reduction

Try to eliminate the wasting. Do we really need this?

Improve the rinsing process to ensure the defects removal

Improve the process to enhance the effectiveness of the cleaning with the chemistry

Wet cleaning is widely used in microchip manufacturing. Single wafer equipment is working as follows. A wafer rotates, and chemistry is poured from a movable nozzle. Water rinsing is performed at the end of the process.
Loading of a new batch of the chemistry resulted in excursion - a strongly increased amount of defects was observed on the wafer after the processing.
The project is dedicated to the failure analysis and creation of innovative solutions.

Wafer cleaning issues at the wet process

Projects related to innovations and problem solving in the microchip manufacturing

Wafer cleaning issues in the wet process

Anything related to the cubic measure of space occupied by an object or the space around it.   'Moving' includes any situations where there is any degree of relative motion or mobility between two or more parts related to the problem.  This relative motion may be a few microns or a considerable distance.

Volume of moving object

Big amount of chemistry or water will be on the wafer

Nesting dolls

The Other way around

Dynamism

Partial or excessive action

Loss or waste of energy that does not contribute to any of the useful functions being performed.  Inefficiency.  Can be partial or complete, permanent or temporary.

Loss of energy

Unpredictably high cost of the process due to the usage of big amount of chemistry or water for rinsing

The extent to which a user is able to learn how to operate, operate or control a system or object.  The convenience of use.

Ease of operation

Local quality

Anti-weight

Self-service

Pneumatics or hydraulics

Component: Filter

The time that an object or system takes to perform an action.  The action may take place over a few milliseconds, or over several years or more.  The parameter is different from 'reliability' (Parameter 35) which is connected to the idea of the time to failure of a system – where it is specifically only the time duration aspect that is at issue.  'Moving' includes any situation where there is any degree of relative motion between two or more parts related to the problem.  The relative motion may be a few microns or considerable distances.

Duration of action by a moving object

Defects remain on the wafer surface after the wet cleaning process step

Because the wet process does not remove the defects

Defects remain on the wafer till the very end of the process.

The chemistry is removed from the wafer before it removes the defects

Because the chemistry contaminates the wafer due to impurities or other properties

Try to eliminate the washing. Do we really need this?

To increase the density of the chemistry by temperature reduction.

Ensure that the chemistry remains on the wafer as long as possible (reduce rotation of the wafer)

Reduce evaporation rate of the chemistry, reduce rotation of the wafer

5+ WHYS Analysis

Increase the temperature of rinsing water

Defects remain on the wafer surface. The wet cleaning process suddenly becomes ineffective.Let's apply the Effective Brainstorming (EBS) tool to generate ideas and prioritize them.

To analyze why the defects remain on the wafer while cleaning with chemistry.The process is as follows:<ul><li>a wafer is kept in the special chuck in 4 points</li><li>chemistry pores from the nozzle on the wafer</li><li>the wafer rotates allows removing the chemistry from the wafer together with the defects</li><li>parameters of the process - chemistry flow, temperature, process time, wafer rotation rate and so on can be adjusted</li></ul>

Functional Modeling using AI

To increase the removal rate, elevate the concentration of H2O2, but also enhance the polish rate - increase the rotation rate and abrasive particles concentration.

Increase the concentration of the abrasive particles - so, the elevation of the concentration of H2O2 should be accompanied by an increase in the concentration of the abrasive particles

Increase the rotation of the pad - increase the polish rate

This project investigates how to increase the copper removal rate during Chemical Mechanical Planarization (CMP). Functional modeling revealed that increasing H₂O₂ alone is ineffective beyond an optimum level because rapid oxidation creates a thick, passivating Cu₂O/CuO layer that must be mechanically removed. The winning direction is to balance faster oxidation with stronger mechanical removal by optimizing pad speed, abrasive concentration, pressure, conditioning, and slurry transport.

Increase the removal rate of Cu at CMP

Mechanics substitution

Discarding and recovering

Component: H2O2 solution

The internal or external contour or profile of a component or system as required for ergonomic and function rather than aesthetic reasons

Shape

To simplify the polish (CMP) operation, it is proposed that the bulk of the Cu be removed at the electroplater just after the completion of the electrodeposition. It is a straightforward process to replace the polarity to make the wafer an anode and give (-) to the anode. It will dissolve the main affected part of the Cu and simplify the following operation - polish.

"Composite materials" is a good principle; maybe we can dip the wafer into another liquid with very low surface tension that is soluble in the electrolyte, such as ethanol or IPA.

"Partial or excessive action" - to make a prewet of the wafer before the inserting into the electrolyte

Another direction for development and real innovation is to remove the residue at the previous operation - dry etch. In this case the Wet etch operation will not be necessary and can be eliminated.

Instead of pouring the solution on the rotating wafer, we can do the opposite and place it face down in the solution bath.

To make Dry etch process in pulses to ensure the pump to pump out and to remove SiF4 and all other gaseous by-products

Etch stop is needed only on the surface of Cu to prevent Cu diffusion from the bottom Cu metal line to the top ILD. Instead of depositing the Etch Stop material with CVD; it is proposed to elaborate a process of selective deposition of PMMA with dissolved SiC or SiN. The liquid can be spined on the wafer and removed from the ILD (SiO2) areas.

To ensure a small gap between the metal line and ILD. It could be made in different ways, such as using soluble Barriers, we can use a difference in temperature expansion coefficients, etc.

Use ILD with non-uniform density. Actually, we need high density of the material to prevent diffusion of Cu in to ILD

Use silicide passivation instead of a thick Ta barrier layer.

The cleaning solution dissolves the residue, but the contaminated solution remains on the wafer and should be removed by the wafer rotation. The rotation of the wafer results in the removal of the cleaning solution. I would propose to apply "Other way around" principle. Instead of pour out the solution on the rotating wafer, we could rotate the wafer (face down) in the bath of the solution. It gives a better possibility of managing the temperature and renovating the cleaning solution on the wafer surface.

Another idea regarding Step 4 - Via Patterning simplification:Why do we need to develop exposed PR at all? Exposed PR is removed by an aqueous solution, meaning it can be removed by plasma. So, the idea is to apply plasma etch directly after exposure.

Regarding the Step 4 - Photo Lithography (PL) operation simplification: Why do we develop within the costly PL equipment? Developing the exposed resist is just a wet etch/clean process that can be performed with regular cheap wet cleaning equipment.

In Step 3 - Sacrificial Light Absorbing Layer deposition - use hot air for the material solidification on the wafer during the Spinon process. This will allow the termination of the furnace and additional movements of the wafer. The high pressure above the rotating wafer will prevent the material from contamination.

Air daps also prevent the formation of voids within the metal via a metal line - we already have voids. Very strong Cu-electromigration might slightly affect the surface of the via and metal line, but the voids will not be formed within the metal.

Semiconductor devices are becoming more complex and expensive. But what exactly are we paying for when we buy a computer, cellphone, or any device containing a microchip? It’s not for radically new functions—the core components remain the same: transistors and interconnections. According to Moore’s law, transistors are getting smaller, with more interconnection layers added, making the manufacturing process longer and more costly.

In reality, we’re paying for the inability of engineers to efficiently solve engineering challenges.

This project leverages System Functional Modeling (SFM) to analyze the IC interconnection layer and Process Functional Modeling (PFM) to evaluate its manufacturing process. These analyses aim to deepen our understanding of both the device and the production process, generating innovative solutions for cost reduction and improved efficiency.

Optimizing IC Interconnection: A Functional Approach to Innovation (Stay updated on the project's progress)

Optimizing IC Interconnection: A Functional Approach to Innovation

No diffusion of Cu or voids formation due to electromigration effect - Metal line remains unchanged

Merging

Parameter changes

Version: Basic version, Component: Barrier - top layer

Loss or waste of elements of a system or its surroundings – substances, materials, sub-systems, products, fields, etc.  Can be partial or complete, permanent or temporary.

Loss of substance

The barrier takes the volume of the via and trench therefore, the volume of the metal via and metal line becomes smaller, reducing the conductivity of the line and affecting the current as a product

The nozzle directs the solution to the wafer to dissolve the residue

Segmentation

Component: Nozzle

This parameter is designed as a catch-all for any form of inefficiency internal to or around a system that manifests as a harmful effect on something around the system.  Can also mean any form of pollutant or environmental emission generated by a system or object.  This is a derivative of the 'loss of substance' definition above, the focus however is on "harmful emissions" this aspect is on the production of chemicals, etc. that was not one of the original substances contained within the system.

Object generated harmful factors

The cleaning solution, together with the dissolved residue remains on the wafer and should be removed by the wafer rotation

Intermediary

Component: Pump

The measure of an object's capacity for doing work.  This parameter focuses on the actual amount of energy (rather than the efficiency of its use, see 27).  'Moving' includes any situation where there is any degree of relative motion between two or more parts related to the problem.  The relative motion may be a few microns or larger amounts.

Use of energy by moving object

Gaseous by-products are not removed and the etch rate reduces

Issues related to manufacturing, fabrication, and assembly and issues associated with an object or system.  Ease of manufacture.

Ease of manufacture

Creation of Cu(2+) ions that are needed for the electrolysis

Composite materials

Component: Electrolyte

Any dimension relating to surfaces or surface area. These may be internal or external. They may also include contact area as well as actual surface area. 'Stationary' includes any situations where there is no form of relative motion between two or more parts related to the problem.

Area of stationary object

The electrolyte does not perfectly remove all the air from the wafer surface and structure

Functional Modeling of the traditional layer

Step 1 Etch Stop Deposition

Step 2 ILD Deposition

Step 3 Sacrificial Layer Deposition for Via

Step 4 Photolithography patterning for Via

Step 5 Via Etch

Step 6 Wet Cleaning after Via Etch

Step 11 Ta-Barrier + Cu-Seed layers Deposition

Step 12 Cu Electroplating

Step 13 Excessive Cu and Barrier Removal by Polish

Step 4 M - Critical Dimensions Measurements (CDM) - Via

Step 7 Sacrificial Layer Deposition for Trench

Step 8 Photolithography Patterning for Trench

Step 8 M - Critical Dimensions Measurements (CDM) - Trench

Step 9 Trench Etch for Metal Line

Step 10 Wet Cleaning after Trench Etch

Step 11 M - Defects Detection & Measurements

Process Functional Modeling - Typical Process

(In development) Process Functional Modeling - New Process

During the loading, the lowest thermocouple received the wrong information; therefore, the bottom part of the furnace became overheated.

The quality of the low-zone wafers is different from the mid-zone and top-zone wafers. For instance, the stoichiometry of SiO2 might change. Even small variations of stoichiometry can result in the same change in optical constants that may affect the model of ellipsometric model and result in SiO2 thickness.

Turn off the heaters of the furnace when the boat is removed. The furnace is big enough to keep the temperature for a long time. Besides, the STABILIZATION step is long enough to compensate for the temperature difference.

Use a mixture of N2 and Ar during LOADING to ensure that all residual air is moved out, even from the bottom zone of the furnace.

Disconnect the thermocouples control during the LOADING if the furnace is turned on.

Start N2 flow just before the LOADING, before the loading of the boat with wafers into the furnace. Turn on the heaters only when the boat is completely loaded into the furnace

Turn off the heaters of the furnace and N2 flow during PRE-LOADING - loading the wafers in the boat

During the PRE-LOADING - loading wafers into the boat, the furnace remains open, resulting in losing N2 gas and electricity. It would be better to cover the bottom of the furnace.

The process is related to microelectronics - microchip manufacturing.

The purpose of the process is to create a SiO2 layer on the surface of a Si wafer.
Equipment: Vertical furnace to heat the wafers in the Q2 atmosphere and perform oxidation on the wafer surface.
Process: The oxidation occurs on the front side and on the back side of the wafer
Requirements: Create a SiO2 thin layer with a certain thickness and low sigma - low standard deviation of the thickness between the wafers and within the wafer

Failure: Wafers from the lower zone have higher thickness and significantly higher within wafer sigma (standard deviation of the thickness within the wafer)

SiO2 thin film creation in Diffusion furnace - Process Functional Modeling

Diffusion furnace - Process Functional Modeling (PFM)

The conditions are as follows:<ul><li>Furnace is open</li><li>Heaters keep the temperature of 300C</li><li>Atmosphere - N2 flows from the top of the furnace down and comes out of the furnace</li><li>Boat is empty</li><li>Wafers are in the FOUP (box for keeping and moving the wafers)</li><li>Robot picks the wafers from the FOUP and loads them into the boat</li></ul>The operation's main purpose is loading the wafers into the boatProduct - Wafers

PRE-LOADING - Loading wafers to boat

The conditions are as follows:<ul><li>Furnace is open</li><li>Heaters keep the temperature of 300C</li><li>Atmosphere - N2 flows from the top of the furnace down and comes out of the furnace</li><li>Wafers are in the boat</li><li>Elevator moves the boat with wafers into the furnace</li></ul>The operation's main purpose is to load the boat with wafers into the furnaceProduct - Boat

LOADING - Loading boat to furnace

The conditions are as follows:<ul><li>Furnace is closed</li><li>Heaters keep the process temperature</li><li>Atmosphere - N2 is kept within the closed furnace</li><li>Boat keeps wafers</li></ul>The operation's main purpose is to achieve an equal temperature within the furnace, to keep the wafers at the same temperature. Product - Wafers within the furnace

STABILIZATION - Dwelling & Temp increase

The conditions are as follows:<ul><li>Furnace is closed</li><li>Heaters keep the process temperature</li><li>Atmosphere - N2 is kept within the closed furnace</li><li>Boat keeps wafers</li><li>O2 is supplied to the furnace to ensure the interaction with wafers to create a SiO2 thin layer on the surface of the wafer.</li></ul>The operation's main purpose is to create SiO2 layerProduct - SiO2 layer

OXIDATION - O2 added

The conditions are as follows:<ul><li>Furnace is closed</li><li>Heaters reduce the temperature down to 300C</li><li>Atmosphere - N2 flows from the top of the furnace down and comes out of the furnace</li><li>Wafers are in the boat</li><li>Elevator moves the boat with wafers down out of the furnace</li></ul>The operation's main purpose is to load the boat with wafers into the furnaceProduct - Boat

UNLOADING - Boat down from furnace

The conditions are as follows:<ul><li>Furnace is open</li><li>Heaters keep the temperature of 300C</li><li>Atmosphere - N2 flows from the top of the furnace down and comes out of the furnace</li><li>Wafers are in the Boat</li><li>Robot picks the wafers from the boat and loads them into the FOUP</li></ul>The operation's main purpose is loading the wafers into the FOUPProduct - Wafers

COOLING & WAFERS UNLOADING

The thickness of the SiO2 thin film is measured using the ellipsometry method. The scheme of the measurements is shown below (the image was taken from <a href="https://www.sciencedirect.com/topics/chemistry/ellipsometry" rel="noopener noreferrer" target="_blank">the article</a>):<img 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">The purpose of the operation is to generate a signal within the detector.The product of the operation is the Detector.

SiO2 THICKNESS MEASUREMENT

Process Functional Modeling

Multi-Layer Sacrificial Ceramic Coatings: Apply several thin, low-cost ceramic (e.g., hydroxyapatite-based) layers instead of one thick expensive coating. Outer layers act as 'disposables' that slowly degrade in varying pH, protecting inner layers and extending overall implant life.

Apply plasma electrolytic oxidation (PEO) during manufacturing to grow a 5-20 µm thick, ceramic-like TiO2 layer with enhanced hardness and adhesion that withstands cyclic mechanical loading and pH swings better than the native passive film.

Establish a standardized post-operative maintenance program requiring quarterly professional debridement combined with daily neutral-pH antiseptic rinses calibrated to maintain oral pH above 6.5 around the implant site.

<h3 class="ql-direction-rtl ql-align-right">רעיון 2 – ציפוי TiN</h3>יישום ציפוי טיטניום ניטריד (TiN) בעל קשיות גבוהה ועמידות משופרת בפני שחיקה וקורוזיה בסביבת חלל הפה.

This project presents an innovative engineering solution for improving the corrosion resistance of dental implants. The proposed concept utilizes multi-layer ceramic and oxide coatings to provide long-term protection against corrosion, wear, and harsh oral conditions. By maintaining inner protective layers even after the outer layer degrades, the design aims to extend implant lifetime, improve reliability, and reduce the risk of implant failure. This concept was developed as part of the Engineering Thinking course in the Materials Engineering program.

Innovative Multi-Layer Coating Design for Dental Implant Corrosion Protection-Adan Daher + Natalie Obied

קורוזיה של שתלים בשניים - נטלי עביד+עדן דאהר

(Robustness) A system's ability to perform its intended functions in predictable ways and conditions.  Also includes durability and issues related to the performance or degradation in performance of an object or system over prolonged periods.

Reliability

שיפור עמידות השתל בפני קורוזיה באמצעות חיזוק שכבת ההגנה על פני השטח והפחתת קצב שחרור יוני המתכת לסביבה הביולוגית.

Another dimension

Cheap short-living objects

הוספת ציפוי מגן מתקדם לשתל עשויה להגדיל את מורכבות תהליך הייצור, להאריך את זמן הייצור ולהעלות את עלויות הייצור בהשוואה לשתל רגיל.

כי פתרונות ההגנה הקיימים אינם מספקים עמידות מספקת לאורך זמן בתנאים הקיימים

כי לאחר פגיעה בשכבת ההגנה המתכת נחשפת לסביבה ומתחילים תהליכי קורוזיה אלקטרוכימיים

כי שכבת התחמוצת נפגעת ונשחקת לאורך זמן עקב החשיפה המתמשכת לתנאי חלל הפה

כי החיידקים והשינויים ברמת החומציות פוגעים בשכבת התחמוצת המגינה על פני הטיטניום

כי השתל חשוף לסביבה אגרסיבית בחלל הפה היא מכילה חיידקים שינוי ברמת החומציות ועומסים מכניים

מתרחשת קורוזיה בשתלים דנטליים מטיטניום, הגורמת לפגיעה בביצועי השתל, לשחרור יוני מתכת ולירידה באורך חיי השתל

Implement a mandatory pre-market multi-modal corrosion qualification protocol combining 12-month cyclic potentiodynamic polarization, tribocorrosion under simulated mastication, and ion-release quantification in pH 3-9 media, rejecting any implant batch that exceeds 0.1 µg/cm²/day metal ion release.

Establish a standardized post-operative maintenance program requiring quarterly professional debridement combined with daily neutral-pH antiseptic rinses calibrated to maintain oral pH above 6.5 around the implant site.

Apply plasma electrolytic oxidation (PEO) with incorporated zinc or gallium ions to create a thick, crystalline TiO2 layer that both strengthens the oxide against acid attack and locally inhibits bacterial metabolism and acid production.

Apply plasma electrolytic oxidation (PEO) during manufacturing to grow a 5-20 µm thick, ceramic-like TiO2 layer with enhanced hardness and adhesion that withstands cyclic mechanical loading and pH swings better than the native passive film.

Alloy titanium with 0.5-2% niobium or tantalum during manufacturing to accelerate spontaneous repassivation kinetics and reduce anodic dissolution rates immediately after oxide layer breach.

Implement atomic layer deposition (ALD) of doped titanium oxide or zirconia nanolayers (5-20 nm) on implant surfaces to create conformal, pinhole-free barriers with enhanced chemical stability under cyclic pH and mechanical stress.

Projects solving problems in the software development world and related processes.

Solving problems and innovations in chemical processes

1372 results in all PRIZ Hub authors