Why a water fine filter can result in problems

Overview

Team

Problem statement

Tools

Ideas

Solution

Current situation

The current situation involves the use of fine filters in microelectronics to reduce the number of particles in water used for wet etch equipment. Initially, a 100 nm filter was installed and successfully reduced the number of defects on the wafer. However, when a 10 nm filter was added in addition to the 100 nm filter, the number of defects on the wafer increased instead of decreasing. Further replacement of the 10 nm filter with a finer 3 nm filter did not improve performance. The main question is why the use of fine filters unexpectedly results in an increased number of defects, and what is the model of failure. A solution needs to be identified to address this issue.

Disadvantages

Increased number of defects on the wafer

Ineffective reduction of particles in the water

Unexplained failure of fine filters to improve performance

Problem statement

What is the underlying failure model that explains why the replacement of fine filters does not improve performance in reducing defects on the wafer?

Success criteria

The model is reasonable and mitigation or failure prevention is proposed.

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