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Updated 09/21/2022
2

Wafer breakage at flash heating

Wafer moves within the chamber during the flash heating

Anatoly Agulyansky
Jun 12 2022 1:02:30 pm

Maybe keep the wafer with a vacuum to avoid any movement of the wafer

Anatoly Agulyansky
Jun 12 2022 1:03:51 pm

Perform the process in vacuum to avoid atmosphere flow

Anatoly Agulyansky
Jun 12 2022 1:30:38 pm

Some parts of the pedestal can be made flexible

Anatoly Agulyansky
Jun 12 2022 1:42:38 pm

To redesign the pins from straight and vertical, they could be spherical or tilted

Anatoly Agulyansky
Jun 12 2022 1:45:35 pm

Reduce pressure prior to flash

Anatoly Agulyansky
Jun 12 2022 1:46:21 pm

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Updated 12/5/2022
2

Wet cleaning is widely used in microchip manufacturing. Single wafer equipment is working as follows. A wafer rotates, and chemistry is poured from a movable nozzle. Water rinsing is performed at the end of the process. Loading of a new batch of the chemistry resulted in excursion - a strongly increased amount of defects was observed on the wafer after the processing. The project is dedicated to the failure analysis and creation of innovative solutions.

Anatoly Agulyansky