login
Updated 03/16/2024
10

SiO2 thin film creation in Diffusion furnace - Process Functional Modeling

Current situation

The thickness standard deviation (sigma) of SiO2 thin layer on the silicon wafer is high

Disadvantages

The high standard deviation of the SiO2 thin layer on the silicon wafer is bad because it indicates that the layer is not uniform and that there are significant variations in the thickness across the wafer. This can lead to issues with the performance of the device and potential reliability issues.

Ideal final result

Use Process Functional Modeling (PFM) to create a model of the process and a model of the failure. Generate a solution

Problem statement

The process conditions are different in the different zones of the furnace. Wafers in the low zone show worse performance.

Login to comment

Similar projects

Wet cleaning is widely used in microchip manufacturing. Single wafer equipment is working as follows. A wafer rotates, and chemistry is poured from a movable nozzle. Water rinsing is performed at the end of the process. Loading of a new batch of the chemistry resulted in excursion - a strongly increased amount of defects was observed on the wafer after the processing. The project is dedicated to the failure analysis and creation of innovative solutions.

Anatoly Agulyansky avatar
Anatoly Agulyansky
Richard Platt avatar
Max 123 123 K avatar
Mike Agulyansky avatar
Alex Agulyansky avatar

Flash heating of a wafer is widely used in microchip manufacturing. The purpose of the process is to prevent the diffusion of ions and atoms. During the flash process, a wafer breakage occurs. The project's purpose is to learn and understand the mechanism of the wafer breakage and propose the solutions to prevent the wafer breakage

Anatoly Agulyansky avatar
Anatoly Agulyansky

The number of particles is a critical parameter for microchip manufacturing. Each, even a very small particle, can potentially destroy a die. Therefore filters are widely used. Water is always filtered through fine filters to reduce the number of particles. Nevertheless, if the filter is too fine, it could cause a problem. This issue was investigated with the help of Functional Modeling. Possible solutions were generated using 40 Inventive Principles.

Anatoly Agulyansky avatar
Anatoly Agulyansky
Alex Agulyansky avatar